(812) 309-78-59
(495) 223-46-76
ASTM F1238-95(1999)
Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications
2 стр.
Заменен
Печатное изданиеЭлектронный (pdf)
81.12 $ (включая НДС 20%)
Разработчик:
Зарубежные/ASTM
ICS:
31.100 Electronic tubes / Электронные лампы
Сборник (ASTM):
10.04 Electronics; Declarable Substances in Materials; 3D Imaging Systems; Additive Manufacturing Technologies / Электроника; Декларируемые вещества в материалах; Системы 3D-визуализации; Аддитивные технологии производства
Тематика:
Electronics
Описание
Область применения

1.1 This specification covers sputtering targets fabricated from metallic silicides (molybdenum silicide, tantalum silicide, titanium silicide, and tungsten silicide). These targets are referred to as refractory silicide targets, and are intended for use in microelectronic applications.

1.2 The values stated in SI units are regarded as standard.

Ключевые слова:
density; microelectronics; molybdenum; disilicide; refractory silicides; sputtering; sputtering targets; tantalum disilicide; titanium disilicide; tungsten disilicide