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BS ISO 17109:2015
Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy. Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
26 стр.
Действует
Печатная копияПечатное издание
257.04 £ (включая НДС 20%)
Разработчик:
Зарубежные/BSI
ICS:
71.040.40 Chemical. Including analysis of gases and surface chemical analysis / Химический анализ. Включая анализ газов
Ключевые слова:
Calibration, Depth, Thin films, Surfaces, Spectroscopy, X-ray photoelectron spectroscopy, Measurement, Photoelectron spectroscopy, Films (states of matter), Auger electron spectroscopy, Chemical analysis and testing, Ions, Analysis