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ASTM F1261M-96

Заменен
Standard Test Method for Determining the Average Electrical Width of a Straight, Thin-Film Metal Line [Metric] — 4 стр.
Область применения

1.1 This test method is designed for determining the average electrical width of a narrow thin-film metallization line.

1.2 This test method is intended for measuring thin metallization lines such as are used in microelectronic circuits where the width of the lines may range from micrometres to tenths of micrometres.

1.3 The test structure used in this test method may be measured while still part of a wafer, or part therefrom, or as part of a test chip bonded to a package and electrically accessible by means of package terminals.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

ICS
31.080.01 Semiconductor devices in general / Полупроводниковые приборы в целом
Сборник ASTM
10.04 Electronics; Declarable Substances in Materials; 3D Imaging Systems; Additive Manufacturing Technologies / Электроника; Декларируемые вещества в материалах; Системы 3D-визуализации; Аддитивные технологии производства
Тематика
Electronics