Formerly under the jurisdiction of Committee F01 on Electronics, this practice was withdrawn in January 2020 in accordance with section 10.6.3 of the Regulations Governing ASTM Technical Committees, which requires that standards shall be updated by the end of the eighth year since the last approval date.

This specification covers sputtering targets fabricated from chromium metal for use in thin film applications. The grades of chromium covered in this specification, are based on the total metallic impurity content of the metallic elements, and are classified as 4N, 3N7, 3N5, 3N, and 2N8. Materials shall be tested using analytical methods such as combustion/infrared spectrometry, thermal conductivity, atomic absorption spectrometry, direct current plasma, inductively coupled plasma, and spark source mass spectroscopy or glow discharge mass spectroscopy; and the individual grades shall conform to specified values of chemical composition, density, grain size.

1.1 This specification covers sputtering targets fabricated from chromium metal.

1.2 This specification sets purity grade levels, physical attributes, analytical methods and packaging requirements.

1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.