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DIN 50450-2:1991-03

Действует
Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N<(Index)2>, Ar, He, Ne and H<(Index)2> by using a galvanic cell — 2 стр.
ICS
71.100.20 Gases. Including compressed air and hydrogen / Газы промышленного применения. Включая сжатый воздух