Formerly under the jurisdiction of Committee E42 on Surface Analysis, this practice was withdrawn in January 2015 in accordance with Section 10.6.3 of the Regulations Governing ASTM Technical Committees, which requires that standards shall be updated by the end of the eighth year since the last approval date.

Careful use of this practice can yield calibrated z-magnifications traceable to the SI unit of length with uncertainties (k = 2) of approximately 7 % over height ranges of approximately 1 nm.

1.1 This practice covers a measurement procedure to calibrate the z-scale of an atomic force microscope using Si(111) monatomic step height specimens.

1.2 Applications This procedure is applicable either in ambient or vacuum condition when the atomic force microscope (AFM) is operated at its highest levels of z-magnification, that is, in the nanometer and sub-nanometer ranges of z-displacement. These ranges of measurement are required when the AFM is used to measure the surfaces of semiconductors, optical surfaces, and other high technology components.

1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only.

1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.