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ASTM F1367-98(2003)

Заменен
Standard Specification for Chromium Sputtering Targets for Thin Film Applications — 2 стр.
Реферат

This specification covers sputtering targets fabricated from chromium metal for use in thin film applications. The grades of chromium covered in this specification, are based on the total metallic impurity content of the metallic elements, and are classified as 4N, 3N7, 3N5, 3N, and 2N8. Materials shall be tested using analytical methods such as combustion/infrared spectrometry, thermal conductivity, atomic absorption spectrometry, direct current plasma, inductively coupled plasma, and spark source mass spectroscopy or glow discharge mass spectroscopy; and the individual grades shall conform to specified values of chemical composition, density, grain size.

Область применения

1.1 This specification covers sputtering targets fabricated from chromium metal.

1.2 This specification sets purity grade levels, physical attributes, analytical methods and packaging requirements.

1.3 The values stated in SI units are regarded as standard.

ICS
25.220.40 Metallic. Including electrolytic depositions, cathodic coatings, autocatalytic coatings, etc. / Металлические покрытия. Включая электролитическое осаждение, катодные покрытия и т.д.
Сборник ASTM
10.04 Electronics; Declarable Substances in Materials; 3D Imaging Systems; Additive Manufacturing Technologies / Электроника; Декларируемые вещества в материалах; Системы 3D-визуализации; Аддитивные технологии производства
Тематика
Electronics