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ASTM F1810-97(2002)

Отменен
Standard Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers (Withdrawn 2003) — 4 стр.
ОписаниеСсылкиВерсии

Ссылочные документы

ASTM F1810-97(2002)
Отменен
Standard Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers (Withdrawn 2003) — 4 стр.
ASTM F1810-97
Заменен
Standard Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers — 4 стр.

На этот документ ссылаются

ASTM F522-94
Заменен
Test Method for Stacking Fault Density of Epitaxial Layers of Silicon by Interference-Contrast Microscopy (Withdrawn 1998) — 4 стр.
ASTM F1810-97(2002)
Отменен
Standard Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers (Withdrawn 2003) — 4 стр.
ASTM F1810-97
Заменен
Standard Test Method for Counting Preferentially Etched or Decorated Surface Defects in Silicon Wafers — 4 стр.