Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Methods used to determine peak intensities and information required when reporting results— 22 стр.
Surface Chemical Analysis. Atomic force microscopy. Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement— 36 стр.
Surface chemical analysis. Proposed procedure for certifying the retained areic dose in a working reference material produced by ion implantation— 30 стр.
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials— 30 стр.
Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials— 14 стр.
Surface chemical analysis. High-resolution Auger electron spectrometers. Calibration of energy scales for elemental and chemical-state analysis— 36 стр.
Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy. Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films— 26 стр.
Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials— 36 стр.
