Terminology relating to weighing machines; terms and definitions relating to components and devices for weighing machines; terms in german, english, french, spanish— 7 стр.
Terminology relating to weighing machines; terms and definitions relating to measuring and calibration; terms in german, english, french, spanish— 10 стр.
Terminology relating to weighing machines; classification into groups; terms and definitions for weighing machines; terms in german, englich, french, spanish— 8 стр.
Aerospace series - Methods for determining the contamination of used fluid filter elements - Part 1: Gravimetric determination of particulate contamination by taking material samples— 4 стр.
Testing of formaldehyde-emitting coating materials, melamin foams and textiles - Determination of the equalization concentration of formaldehyde in a small test chamber— 7 стр.
Rapid determination of the non-volatile matter content; foil method for resins, resin solutions, paints, varnishes and similar coating materials— 4 стр.
Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 1: Silver (Ag), gold (Au), calcium (Ca), copper (Cu), iron (Fe), potassium (K) and sodium (Na) in nitric acid by AAS— 8 стр.
Testing of materials for semiconductor technology - Determination of trace elements in liquids - Part 2: Calcium (Ca), cobalt (Co), chromium (Cr), copper (Cu), Iron (Fe), nickel (Ni) and zinc (Zn) in hydrofluoric acid with plasma-induced emission spectroscopy— 8 стр.
Testing of materials for semiconductor technology - Method for the characterisation of moulding compounds for electronic components - Part 3: Determination of cationic impurities— 2 стр.
Testing of materials for semiconductor technology - Method for the characterisation of moulding compounds for electronic components - Part 2: Determination of ionic impurities using pressure cooker test— 2 стр.
Testing of materials for semiconductor technology - Determination of traces of elements in liquids - Part 3: Aluminium (Al), cobalt (Co), copper (Cu), sodium (Na), nickel (Ni) and zinc (Zn) in nitric acid by ICP-MS— 8 стр.
Determination of cobalt, chromium, copper, iron and nickel as impurities in hydrofluoric acid for use in semiconductor technology by plasma-induced emission spectrometry— 2 стр.
Testing of materials for semiconductor technology - Determination of traces of metals in liquids - Part 3: Al, Co, Cu, Na, Ni and Zn in nitric acid with ICP-MS— 2 стр.